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Various routes for low temperature RFmagnetron sputtering of Indium Tin Oxide films

dc.contributor.authorSousa, M. G.
dc.contributor.authorCunha, A. F. da
dc.contributor.authorFernandes, P. A.
dc.date.accessioned2019-03-19T14:53:43Z
dc.date.available2019-03-19T14:53:43Z
dc.date.issued2014
dc.description.abstractIn this work we have studied the influence of the Ar working pressure, substrate temperature, low power plasma irradiation and partial pressure of hydrogen in the RF-magnetron sputtering of indium tin oxide (ITO) thin films on glass substrates. This work aims at identifying the best conditions to achieve good quality ITO film at low temperature. Four sets of samples were prepared which were characterized by scanning electron microscopy, X-ray diffraction (XRD), Van der Pauw, transmittance and absorbance measurementspt_PT
dc.description.versionN/Apt_PT
dc.identifier.urihttp://hdl.handle.net/10400.22/13047
dc.language.isoengpt_PT
dc.relationStrategic Project - LA 25 - 2011-2012
dc.titleVarious routes for low temperature RFmagnetron sputtering of Indium Tin Oxide filmspt_PT
dc.typeconference object
dspace.entity.typePublication
oaire.awardTitleStrategic Project - LA 25 - 2011-2012
oaire.awardURIinfo:eu-repo/grantAgreement/FCT/5876-PPCDTI/PTDC%2FCTM-MET%2F113486%2F2009/PT
oaire.awardURIinfo:eu-repo/grantAgreement/FCT/6820 - DCRRNI ID/PEst-C%2FCTM%2FLA0025%2F2011/PT
oaire.awardURIinfo:eu-repo/grantAgreement/FCT/COMPETE/RECI%2FFIS-NAN%2F0183%2F2012/PT
oaire.fundingStream5876-PPCDTI
oaire.fundingStream6820 - DCRRNI ID
oaire.fundingStreamCOMPETE
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.identifierhttp://doi.org/10.13039/501100001871
project.funder.nameFundação para a Ciência e a Tecnologia
project.funder.nameFundação para a Ciência e a Tecnologia
project.funder.nameFundação para a Ciência e a Tecnologia
rcaap.rightsopenAccesspt_PT
rcaap.typeconferenceObjectpt_PT
relation.isProjectOfPublication1d093126-c93f-4fcc-bb2f-94316fa4ffcb
relation.isProjectOfPublication8ac04333-23a1-4d57-92f3-1cfcb1695aeb
relation.isProjectOfPublication5713a20d-7d95-42d9-9a8a-2ef641090513
relation.isProjectOfPublication.latestForDiscovery1d093126-c93f-4fcc-bb2f-94316fa4ffcb

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