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Numerical Simulation Applied to PVD Reactors: An Overview

2018Journal article Open access
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dc.contributor.authorPinto, Gustavo Filipe
dc.contributor.authorSilva, Francisco
dc.contributor.authorPorteiro, Jacobo
dc.contributor.authorMínguez, José
dc.contributor.authorBaptista, Andresa
dc.date.accessioned2020-04-27T16:47:32Z
dc.date.available2020-04-27T16:47:32Z
dc.date.issued2018
dc.description.abstractThe technological evolution in the last century also required an evolution of materials and coatings. Therefore, it was necessary to make mechanical components subject to heavy wear more reliable, improving their mechanical strength and durability. Surfaces can contribute decisively to extending the lifespan of mechanical components. Chemical vapor deposition (CVD) and physical vapor deposition (PVD) technologies have emerged to meet the new requirements that have enabled a remarkable improvement in the morphology, composition and structure of films as well as an improved adhesion to the substrate allowing a greater number of diversified applications. Thin films deposition using PVD coatings has been contributing to tribological improvement, protecting their surfaces from wear and corrosion, as well as enhancing their appearance. This process can be an advantage over other processes due to their excellent properties and environmental friendly behavior, which gives rise to a large number of studies in mathematical modelling and numerical simulation, like finite element method (FEM) and computational fluid dynamics (CFD). This review intends to contribute to a better PVD process knowledge, in the fluids and heat area, using CFD simulation methods focusing on the process energy efficiency improvement regarding the industrial context with the sputtering technique.pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.doi10.3390/coatings8110410pt_PT
dc.identifier.urihttp://hdl.handle.net/10400.22/15872
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.relation.publisherversionhttps://www.mdpi.com/2079-6412/8/11/410pt_PT
dc.subjectCFD simulationpt_PT
dc.subjectFEM simulationpt_PT
dc.subjectRreactorpt_PT
dc.subjectPhysical vapor depositionpt_PT
dc.subjectCoatingpt_PT
dc.subjectNumerical modellingpt_PT
dc.titleNumerical Simulation Applied to PVD Reactors: An Overviewpt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.issue11pt_PT
oaire.citation.startPage410pt_PT
oaire.citation.titleCoatingspt_PT
oaire.citation.volume8pt_PT
person.familyNamePinto
person.familyNameSilva
person.familyNameBaptista
person.givenNameGustavo Filipe
person.givenNameFrancisco
person.givenNameAndresa
person.identifier1422904
person.identifier.ciencia-idA01E-E566-B4D8
person.identifier.ciencia-idB81C-4758-2D59
person.identifier.ciencia-id6218-CAE6-A673
person.identifier.orcid0000-0003-0032-7356
person.identifier.orcid0000-0001-8570-4362
person.identifier.orcid0000-0001-6968-3450
person.identifier.ridI-5708-2015
person.identifier.scopus-author-id57192392216
person.identifier.scopus-author-id56870827300
rcaap.rightsopenAccesspt_PT
rcaap.typearticlept_PT
relation.isAuthorOfPublicationd4ec0a75-5b85-4ce2-a656-694c806fb9d9
relation.isAuthorOfPublicationd050c135-4d9d-4fb2-97d1-cac97be3f6b9
relation.isAuthorOfPublication97f67b94-982c-43fe-a0a2-a7d3243ee9cd
relation.isAuthorOfPublication.latestForDiscoveryd050c135-4d9d-4fb2-97d1-cac97be3f6b9

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