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Orientador(es)
Resumo(s)
This study explores the development and characterization of zirconium aluminum nitride (ZrAlN) thin films produced via magnetron sputtering for temperature sensing applications. The sensor film is integrated into a fully nitride multilayer coating and designed to work in harsh environments. The ZrAlN demonstrated stable semiconductor behavior up to 750 °C, making it suitable for high-temperature thermistors, with a β value of approximately 850 K after signal stabilization. Detailed structural characterization confirmed a mixed-phase structure of poorly crystalline cubic ZrN and orthorhombic Zr3N4. This structure is believed to be responsible for the high resistivity of 8.0 × 105 µΩ·cm observed in Zr1-xAlxN with x = 0.3. The examination of Zr0.7Al0.3N integrated into the multilayer coating revealed a columnar morphology with diffuse nanolayers, alternating between aluminum-rich and aluminum-poor zones, caused by the two-fold rotational deposition. The sensor coating was further tested on a cutting tool substrate, with the Zr0.7Al0.3N layer exhibiting a sensitivity of 800 K and demonstrating effective temperature measurements up to 400 °C. The Zr0.7Al0.3N layer inserted in a nitride-based multilayer coating, combined with Arduino® for signal acquisition, resulted in a measured error of approximately 7 %. The setup presented the potential for integration into manufacturing environments aligned with Industry 4.0.
Descrição
Palavras-chave
NTC thin-film thermistor Magnetron sputtering Zr1-xAlxN thin films Multilayer coating Temperature sensing Industry 4.0
Contexto Educativo
Citação
Bruno Martins, Carlos Patacas, Albano Cavaleiro, Pedro Faia, Cristiana F. Almeida Alves, Enrique Carbo-Argibay, Paulo J. Ferreira, Filipe Fernandes, Zirconium aluminum nitride thin films for temperature sensing applications, Journal of Alloys and Compounds, Volume 1013, 2025, 178546, https://doi.org/10.1016/j.jallcom.2025.178546
Editora
Elsevier