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On the Physical Vapour Deposition (PVD): Evolution of Magnetron Sputtering Processes for Industrial Applications

2018Journal article Open access
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dc.contributor.authorBaptista, Andresa
dc.contributor.authorSilva, F.J.G.
dc.contributor.authorPorteiro, J.
dc.contributor.authorMíguez, J.L.
dc.contributor.authorPinto, Gustavo Filipe
dc.contributor.authorFernandes, L.
dc.date.accessioned2020-04-27T17:29:27Z
dc.date.available2020-04-27T17:29:27Z
dc.date.issued2018
dc.description.abstractAdvanced coatings play an important role in a wide range of industrial applications. These coatings are commonly used in machining tools due to their high hardness and wear resistance, but also can be applied in jewellery and decorative purposes. Deposition techniques have seen a strong evolution as result of the directly related devices, control evolution and software. Several variants have been developed around the main techniques: arc evaporation and sputtering. The coatings produced present significant differences in their characteristics, namely in terms of structure, mechanical properties and surface morphology. Depending on the substrate material and application, the deposition process needs to be properly selected, providing the particular characteristics requested. This paper intends to do a critical review of the evolution of the advanced coatings deposition process, mainly focused on the Physical Vapour Deposition (PVD) process, particularly in the Magnetron Sputtering technique, which is able to produce smooth surfaces, using lower temperatures, presenting excellent mechanical and tribological properties and having very good adhesion to the main materials used as substrate.pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.doi10.1016/j.promfg.2018.10.125pt_PT
dc.identifier.urihttp://hdl.handle.net/10400.22/15876
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherElsevierpt_PT
dc.relation.publisherversionhttps://www.sciencedirect.com/science/article/pii/S2351978918312435?via%3Dihubpt_PT
dc.subjectPVD optimization processpt_PT
dc.subjectPVD Techniquept_PT
dc.subjectSputteringpt_PT
dc.subjectDeposition Improvementpt_PT
dc.subjectReactorespt_PT
dc.subjectCoatingpt_PT
dc.titleOn the Physical Vapour Deposition (PVD): Evolution of Magnetron Sputtering Processes for Industrial Applicationspt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.endPage757pt_PT
oaire.citation.startPage746pt_PT
oaire.citation.titleProcedia Manufacturingpt_PT
oaire.citation.volume17pt_PT
person.familyNameBaptista
person.familyNameSilva
person.familyNamePinto
person.givenNameAndresa
person.givenNameFrancisco
person.givenNameGustavo Filipe
person.identifier1422904
person.identifier.ciencia-id6218-CAE6-A673
person.identifier.ciencia-idB81C-4758-2D59
person.identifier.ciencia-idA01E-E566-B4D8
person.identifier.orcid0000-0001-6968-3450
person.identifier.orcid0000-0001-8570-4362
person.identifier.orcid0000-0003-0032-7356
person.identifier.ridI-5708-2015
person.identifier.scopus-author-id56870827300
person.identifier.scopus-author-id57192392216
rcaap.rightsopenAccesspt_PT
rcaap.typearticlept_PT
relation.isAuthorOfPublication97f67b94-982c-43fe-a0a2-a7d3243ee9cd
relation.isAuthorOfPublicationd050c135-4d9d-4fb2-97d1-cac97be3f6b9
relation.isAuthorOfPublicationd4ec0a75-5b85-4ce2-a656-694c806fb9d9
relation.isAuthorOfPublication.latestForDiscoveryd4ec0a75-5b85-4ce2-a656-694c806fb9d9

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