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A critical review on the numerical simulation related to Physical Vapour Deposition

2018Journal article Open access
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dc.contributor.authorPinto, Gustavo Filipe
dc.contributor.authorSilva, F.J.G.
dc.contributor.authorPorteiro, J.
dc.contributor.authorMíguez, J.L.
dc.contributor.authorBaptista, Andresa
dc.contributor.authorFernandes, L.
dc.date.accessioned2020-04-27T18:07:41Z
dc.date.available2020-04-27T18:07:41Z
dc.date.issued2018
dc.description.abstractPhysical Vapour Deposition (PVD) is a process usually used for the production of advanced coatings regarding its application in several industrial and current products, such as optical lens, moulds and dies, decorative parts or tools. This process has several variants due to its strong evolution along the last decades. The process is commonly assisted by plasma, creating a particular low pressure and medium temperature atmosphere, which is responsible for the transition of atomic particles between the target and the parts to be coated into a vacuum reactor. Several parameters are directly affecting the deposition, namely the substrate temperature, pressure inside the reactor, assisting gases used, type of current, power supply, bias, substrate and target materials, samples holder and corresponding rotation, deposition time, among others. Many mathematical models have been developed in order to allow the generation of numerical simulation applications, trying to combine parameters and expect the corresponding results. Numerical simulation applications were created around the mathematical models previously developed, which can play an important role in the prediction of the coating properties and structure. This paper intends to describe the numerical simulation evolution in the last years, namely the use of Finite Elements Method (FEM) and Computational Fluid Dynamics (CFD).pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.doi10.1016/j.promfg.2018.10.138pt_PT
dc.identifier.urihttp://hdl.handle.net/10400.22/15879
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherElsevierpt_PT
dc.relationUID/2016pt_PT
dc.relation.publisherversionhttps://www.sciencedirect.com/science/article/pii/S2351978918312587?via%3Dihubpt_PT
dc.subjectSimulationpt_PT
dc.subjectReactorpt_PT
dc.subjectPhysical Vapor Depositionpt_PT
dc.subjectCoatingpt_PT
dc.subjectNumerical Modellingpt_PT
dc.subjectFinite Element Methodpt_PT
dc.subjectComputational Fluid Dynamicspt_PT
dc.titleA critical review on the numerical simulation related to Physical Vapour Depositionpt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.conferencePlaceOhiopt_PT
oaire.citation.endPage869pt_PT
oaire.citation.startPage860pt_PT
oaire.citation.titleProcedia Manufacturingpt_PT
oaire.citation.volume17pt_PT
person.familyNamePinto
person.familyNameSilva
person.familyNameBaptista
person.givenNameGustavo Filipe
person.givenNameFrancisco
person.givenNameAndresa
person.identifier1422904
person.identifier.ciencia-idA01E-E566-B4D8
person.identifier.ciencia-idB81C-4758-2D59
person.identifier.ciencia-id6218-CAE6-A673
person.identifier.orcid0000-0003-0032-7356
person.identifier.orcid0000-0001-8570-4362
person.identifier.orcid0000-0001-6968-3450
person.identifier.ridI-5708-2015
person.identifier.scopus-author-id57192392216
person.identifier.scopus-author-id56870827300
rcaap.rightsopenAccesspt_PT
rcaap.typearticlept_PT
relation.isAuthorOfPublicationd4ec0a75-5b85-4ce2-a656-694c806fb9d9
relation.isAuthorOfPublicationd050c135-4d9d-4fb2-97d1-cac97be3f6b9
relation.isAuthorOfPublication97f67b94-982c-43fe-a0a2-a7d3243ee9cd
relation.isAuthorOfPublication.latestForDiscovery97f67b94-982c-43fe-a0a2-a7d3243ee9cd

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