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Study of vanadium doped ZnO films prepared by dc reactive magnetron sputtering at different substrate temperatures

dc.contributor.authorMeng, Lijian
dc.contributor.authorTeixeira, Vasco
dc.contributor.authorSantos, M. P.
dc.date.accessioned2014-01-06T15:11:06Z
dc.date.available2014-01-06T15:11:06Z
dc.date.issued2013
dc.description.abstractZnO films doped with vanadium (ZnO:V) have been prepared by dc reactive magnetron sputtering technique at different substrate temperatures (RT–500 C). The effects of the substrate temperature on ZnO:V films properties have been studied. XRD measurements show that only ZnO polycrystalline structure has been obtained, no V2O5 or VO2 crystal phase can be observed. It has been found that the film prepared at low substrate temperature has a preferred orientation along the (002) direction. As the substrate temperature is increased, the (002) peak intensity decreases. When the substrate temperature reaches the 500 C, the film shows a random orientation. SEM measurements show a clear formation of the nano-grains in the sample surface when the substrate temperature is higher than 400 C. The optical properties of the films have been studied by measuring the specular transmittance. The refractive index has been calculated by fitting the transmittance spectra using OJL model combined with harmonic oscillator.por
dc.identifier.doi10.1166/jnn.2013.6053pt_PT
dc.identifier.issn1533-4880
dc.identifier.urihttp://hdl.handle.net/10400.22/3227
dc.language.isoengpor
dc.peerreviewedyespor
dc.publisherAmerican Scientific Publisherspor
dc.relation.ispartofseriesJournal of Nanoscience and Nanotechnology; Vol. 13, Issue 2
dc.relation.publisherversionhttp://www.ingentaconnect.com/content/asp/jnn/2013/00000013/00000002/art00138?token=004611e1d5a666f3a7b6c2a4038425e6b66477e3f2a49264f655d375c6b68763050210por
dc.subjectZinc Oxidepor
dc.subjectVanadium Oxidepor
dc.subjectThin Filmspor
dc.subjectSputteringpor
dc.subjectOptical Propertiespor
dc.titleStudy of vanadium doped ZnO films prepared by dc reactive magnetron sputtering at different substrate temperaturespor
dc.typejournal article
dspace.entity.typePublication
oaire.citation.endPage1384por
oaire.citation.issueIssue 2
oaire.citation.startPage1381por
oaire.citation.titleJournal of Nanoscience and Nanotechnologypor
oaire.citation.volumeVol. 13por
rcaap.rightsclosedAccesspor
rcaap.typearticlepor

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