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Effect of substrate bias voltage on structural and tribological properties of W-Ti-C-N thin films produced by combinational HiPIMS and DCMS co-sputtering

dc.contributor.authorAtaie, S.A.
dc.contributor.authorSoltanieh, M.
dc.contributor.authorNaghizadeh, R.
dc.contributor.authorCavaleiro, A.
dc.contributor.authorEvaristo, M.
dc.contributor.authorFernandes, F.
dc.contributor.authorFerreira, F.
dc.date.accessioned2024-01-19T11:39:00Z
dc.date.available2024-01-19T11:39:00Z
dc.date.issued2023-02-10
dc.description.abstractProtective multi-component thin films at the surface of cutting tools have been significantly developed to reduce wear and friction. The present work investigates the effect of substrate bias voltage on the structural-tribological relations of W-Ti-C-N thin films produced by HiPIMS and DCMS co-sputtering. Chemical analysis of the coatings is obtained and composite phase structure is revealed. Morphology of the coatings illustrates that defectless surfaces may be achieved. Topographical parameters are investigated by employing graphical software. Indentation, scratch and pin-on-disk tests (pin is AISI 52100 steel) are applied to study mechanical behaviors of the films. To produce a wear-resistant film, a median bias voltage (􀀀 60 V) and as a result, optimum content of tungsten concentration (19.2 at. %), grain size (42.8 nm) and average peak interval (188 nm) is required. Finally, a model based on the representative volume element is developed to show crack propagation and delamination.pt_PT
dc.description.versioninfo:eu-repo/semantics/publishedVersionpt_PT
dc.identifier.doi10.1016/j.wear.2023.204654pt_PT
dc.identifier.urihttp://hdl.handle.net/10400.22/24562
dc.language.isoengpt_PT
dc.peerreviewedyespt_PT
dc.publisherElsevier B.V.pt_PT
dc.subjectPVD coatingspt_PT
dc.subjectSurface topographypt_PT
dc.subjectIndentationpt_PT
dc.subjectWear testingpt_PT
dc.subjectCutting toolspt_PT
dc.titleEffect of substrate bias voltage on structural and tribological properties of W-Ti-C-N thin films produced by combinational HiPIMS and DCMS co-sputteringpt_PT
dc.typejournal article
dspace.entity.typePublication
oaire.citation.startPage204654pt_PT
oaire.citation.titleWearpt_PT
oaire.citation.volume520-521pt_PT
rcaap.rightsopenAccesspt_PT
rcaap.typearticlept_PT

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