Browsing by Author "Porteiro, J."
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- A critical review on the numerical simulation related to Physical Vapour DepositionPublication . Pinto, Gustavo Filipe; Silva, F.J.G.; Porteiro, J.; Míguez, J.L.; Baptista, Andresa; Fernandes, L.Physical Vapour Deposition (PVD) is a process usually used for the production of advanced coatings regarding its application in several industrial and current products, such as optical lens, moulds and dies, decorative parts or tools. This process has several variants due to its strong evolution along the last decades. The process is commonly assisted by plasma, creating a particular low pressure and medium temperature atmosphere, which is responsible for the transition of atomic particles between the target and the parts to be coated into a vacuum reactor. Several parameters are directly affecting the deposition, namely the substrate temperature, pressure inside the reactor, assisting gases used, type of current, power supply, bias, substrate and target materials, samples holder and corresponding rotation, deposition time, among others. Many mathematical models have been developed in order to allow the generation of numerical simulation applications, trying to combine parameters and expect the corresponding results. Numerical simulation applications were created around the mathematical models previously developed, which can play an important role in the prediction of the coating properties and structure. This paper intends to describe the numerical simulation evolution in the last years, namely the use of Finite Elements Method (FEM) and Computational Fluid Dynamics (CFD).
- On the Physical Vapour Deposition (PVD): Evolution of Magnetron Sputtering Processes for Industrial ApplicationsPublication . Baptista, Andresa; Silva, F.J.G.; Porteiro, J.; Míguez, J.L.; Pinto, Gustavo Filipe; Fernandes, L.Advanced coatings play an important role in a wide range of industrial applications. These coatings are commonly used in machining tools due to their high hardness and wear resistance, but also can be applied in jewellery and decorative purposes. Deposition techniques have seen a strong evolution as result of the directly related devices, control evolution and software. Several variants have been developed around the main techniques: arc evaporation and sputtering. The coatings produced present significant differences in their characteristics, namely in terms of structure, mechanical properties and surface morphology. Depending on the substrate material and application, the deposition process needs to be properly selected, providing the particular characteristics requested. This paper intends to do a critical review of the evolution of the advanced coatings deposition process, mainly focused on the Physical Vapour Deposition (PVD) process, particularly in the Magnetron Sputtering technique, which is able to produce smooth surfaces, using lower temperatures, presenting excellent mechanical and tribological properties and having very good adhesion to the main materials used as substrate.