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Orientador(es)
Resumo(s)
A novel architecture that comprises rear interface passivation and increased rear optical reflection is presented with the following advantages: i) enhanced optical reflection is achieved by the deposition of a metallic layer over the Mo rear contact; ii) improved interface quality with CIGS by adding a sputtered Al 2 O 3 layer over the metallic layer; and, iii) optimal ohmic electrical contact ensured by rear-openings refilling with a second layer of Mo as generally observed from the growth of CIGS on Mo. Hence, a decoupling between the electrical function and the optical purpose of the rear substrate is achieved. We present in detail the manufacturing procedure of such type of architecture together with its benefits and caveats. A preliminary analysis showing an architecture proof-of-concept is presented and discussed.
Descrição
Palavras-chave
Contacts Aluminum oxide Passivation Photovoltaic cells Optical device fabrication Nanotechnology Lithography
Contexto Educativo
Citação
Editora
IEEE