Utilize este identificador para referenciar este registo: http://hdl.handle.net/10400.22/3479
Título: Properties of tantalum oxynitride thin films produced by magnetron sputtering: the influence of processing parameters
Autor: Cristea, D.
Constantin, D.
Crisan, A.
Abreu, Cristiano
Gomes, J. R.
Barradas, N. P.
Alves, E.
Moura, C.
Vaz, F.
Cunha, L.
Palavras-chave: Tantalum oxynitride
Optical properties
Tribological behaviour
Data: 2013
Editora: Elsevier
Relatório da Série N.º: Vacuum; Vol. 98
Resumo: The main purpose of this work is to present and to interpret the change of structure and physical properties of tantalum oxynitride (TaNxOy) thin films, produced by dc reactive magnetron sputtering, by varying the processing parameters. A set of TaNxOy films was prepared by varying the reactive gases flow rate, using a N2/O2 gas mixture with a concentration ratio of 17:3. The different films, obtained by this process, exhibited significant differences. The obtained composition and the interpretation of X-ray diffraction results, shows that, depending on the partial pressure of the reactive gases, the films are: essentially dark grey metallic, when the atomic ratio (N + O)/Ta < 0.1, evidencing a tetragonal β-Ta structure; grey-brownish, when 0.1 < (N + O)/Ta < 1, exhibiting a face-centred cubic (fcc) TaN-like structure; and transparent oxide-type, when (N + O)/Ta > 1, evidencing the existence of Ta2O5, but with an amorphous structure. These transparent films exhibit refractive indexes, in the visible region, always higher than 2.0. The wear resistance of the films is relatively good. The best behaviour was obtained for the films with (N + O)/Ta ≈ 0.5 and (N + O)/Ta ≈ 1.3.
Peer review: yes
URI: http://hdl.handle.net/10400.22/3479
ISSN: 0042-207X
Versão do Editor: http://www.sciencedirect.com/science/article/pii/S0042207X13000973
Aparece nas colecções:ISEP – DFI – Artigos

Ficheiros deste registo:
Ficheiro Descrição TamanhoFormato 
ART_DCristea_2013_DFI.pdf425,08 kBAdobe PDFVer/Abrir

FacebookTwitterDeliciousLinkedInDiggGoogle BookmarksMySpace
Formato BibTex MendeleyEndnote Degois 

Todos os registos no repositório estão protegidos por leis de copyright, com todos os direitos reservados.